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カテゴリーなし

Metrological characterization of different methods for recovering the optically sectioned image by means of structured light

Optical Metrology, カテゴリーなし
研究開発テクニシャン、物理学理学士、フォトニクス理学修士 at Sensofar Metrology | Other articles

学士号のインターンシップでSensofar入社。以降、Sensofarシステムの測定性能をテストする研究開発部で光学技法のアルゴリズム開発および既存アルゴリズムの改良に携わる。現在、カタルーニャ工科大学(UPC)でSensofarと共同で表面測定の超高速光学センサーに関する産業博士研究を行っている。光学設計と光学式測定を主な研究分野とする。

Abstract

Imaging confocal microscopy (ICM) and focus variation (FV) are two of the most used technologies for 3D surface metrology. Both methods rely on the depth of focus of the microscope objective, which depends on its numerical aperture and wavelength of the light source to compute an optical section. In this paper we study how several methods of structured illumination microscopy affect the metrological characteristics of an areal optical profiler. We study the effect of the projection of different structured patterns, the sectioning algorithms, and the use of high and low frequency components onto the optically sectioned image. We characterized their performance in terms of system noise, instrument transfer function and metrological characteristics such as roughness parameters and step height values.

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